PE1-1.5 Film Deposition, Metallization & Packaging

Standard semiconductor process technology — written September 2026

What this is and why it exists

Lithography and etching shape material. Something has to put that material there in the first place. Something else has to connect the finished devices and get them into a form a customer can solder.

That is this topic. It ends with packaging, which students skip and industry cares about most.

The vocabulary

  • Chemical vapour deposition — building a film from gases that react at the wafer surface.
  • LPCVD — the low pressure variant, giving better uniformity.
  • PECVD — the plasma assisted variant, which works at much lower temperature.
  • Step coverage — how evenly a film covers a surface that is not flat.
  • Thermal evaporation — heating a source until it vapourises and condenses on the wafer.
  • Sputtering — knocking atoms off a target with ions so they land on the wafer.
  • Metallization — forming the conducting connections between devices.
  • Electromigration — metal atoms carried along by a heavy current, eventually breaking the conductor.
  • Die bonding — attaching the cut die to its package.
  • Package — the housing that gives the die connections, protection and a heat path.

The mental model

Deposition divides into two families by where the material comes from.

Chemical deposition builds the film out of a reaction at the wafer surface. Gases are supplied, they react, and the solid product stays behind. Because the gas reaches every exposed surface, coverage is even, including down inside narrow features. That is its main strength.

Its variants differ mainly in how the energy for the reaction is supplied. The plain version uses heat. The low pressure version also uses heat but at reduced pressure, which improves uniformity across the wafer. The plasma assisted version supplies much of the energy as a plasma instead, so the wafer can stay far cooler. That last one matters enormously, because it allows deposition after the metal is already on the wafer, which heat alone would not permit.

Physical deposition takes material from a solid source and moves it across to the wafer. Thermal evaporation heats the source until it vapourises, and the vapour condenses wherever it lands. It is the simplest method and it covers steps badly. The material arrives from one direction, so the far side of any step is in shadow.

Sputtering fixes that. Ions knock atoms off a target, and those atoms arrive from a wider spread of directions with more energy. Step coverage is better, adhesion is better, and alloys keep their composition, which evaporation does not manage. Most metal layers are sputtered for those reasons.

Metallization is where a working circuit finally appears. Devices formed in the silicon are joined by conducting tracks, and the reliability limit is electromigration. A heavy current does not merely heat a conductor; it drags metal atoms along with it. Over time material piles up in one place and thins in another until the conductor opens. That limit is why a design rule sets a maximum current for a given conductor width.

Packaging closes the process and is not a formality. The package provides three things. It gives connections a person or a machine can attach to, at a pitch far coarser than anything on the die. It protects the silicon from moisture and handling. And it carries heat away, which for many parts is what actually limits performance.

The die is first attached to the package, then connected to its leads, then sealed. Package choice sets the number of connections available, the thermal performance and a large share of the unit cost. For many products the package costs more than the silicon inside it, which surprises people who have spent a term on the silicon.

What you should now be able to explain or do

Compare chemical and physical deposition, and say which gives better coverage inside features. Say what the low pressure and plasma variants each change, and why plasma assistance allows deposition after metal. Compare evaporation with sputtering on step coverage, adhesion and alloys. Explain electromigration and the design rule it produces. Say what a package provides and why it can cost more than the die.

Check yourself

The gas reaches every exposed surface. Evaporated material arrives from one direction, so the far side of a step is in shadow.

It supplies the reaction energy without heating the wafer. Films can then be deposited after the metal is present, which high temperature would damage.

Better step coverage and adhesion, and alloys keep their composition. Evaporation separates alloy components by their boiling points.

A heavy current dragging metal atoms along a conductor. Material thins in one place and piles up in another until it fails.

Connections at a usable pitch, protection from moisture and handling, and a path for heat out of the die.

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